C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 209/60 (2006.01) C08F 2/48 (2006.01) C09B 23/01 (2006.01) C09B 57/00 (2006.01) G03F 7/029 (2006.01) G03F 7/031 (2006.01)
Patent
CA 2176931
A photopolymerizable composition comprising a squarylium compound represented by general formula (I), a free-radical generator and an addition-polymerizable compound having at least one ethylenic unsaturation, wherein R represents C2- C8 alkyl.
Composition photopolymérisable comprenant un composé au squarylium représenté par la formule générale (I), un générateur de radicaux libres ainsi qu'un composé polymérisable par addition présentant au moins une insaturation éthylénique, formule dans laquelle R représente alkyle C¿2?-C¿8?.
Kinoshita Hirotaka
Koseki Kenichi
Matsushita Shoshiro
Shimizu Ikuo
Toyoda Hiroshi
Kirby Eades Gale Baker
Kyowa Hakko Kogyo Co. Ltd.
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