C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
252/121, 402/3,
C08F 4/00 (2006.01) C08F 2/50 (2006.01) C08J 3/28 (2006.01)
Patent
CA 1175036
Abstract The present invention relates to a photopolymerizable composition comprising a polymerizable, polyethylenically unsaturated compound, benzil and/or fluorenone, a specific biphenyl ketone such as para-phenyl benzophenone, and a reducing agent such as a tertiary amine. The present composition permits rapid and complete curing. Moreover, in the photopolymerization of compounds sensitive to air inhibition non-tacky surfaces are obtained. The effect observed is based on a synergism between the present photoinitiators. The advantages of the invention are most manifest in curing relatively thick layers of materials.
389176
Jaspers Hans
Van Der Hauw Tjerk
Akzona Incorporated
Swabey Ogilvy Renault
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