Photopolymerizable compositions

Details Photopolymerizable compositions Photopolymerizable compositions

C - Chemistry, Metallurgy

08

F

402/391

C08F 2/50 (2006.01) G03F 7/031 (2006.01)

Patent

CA 1222091

ABSTRACT OF THE DISCLOSURE A photopolymerizable composition which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymeri- zation initiator system, characterized in that said photopolymerization initiator system essentially consists of: (a) a p-dialkylaminostyrene derivative or p-dialkyl- aminophenylbutadiene derivative represented by the general formula Image wherein R1 and R2 independently represent an alkyl group; Y represents a divalent atom or atomic group selected from the group consisting of -O-, -S- and -CH=CH- and forms aromatic heterocyclic ring B together with trivalent nitrogen atom, and ring A represents a benzene ring or naphthalene ring con- densed with ring B, and n is 1 or 2; (b) a hexaarylbiimidazole; and (c) a thiol compound represented by the general formula Image wherein Z represents a divalent atom or atomic group selected from the group consisting of -O-, S-, -NH- and Image

437484

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