G - Physics – 03 – F
Patent
G - Physics
03
F
96/179, 400/1815
G03F 7/033 (2006.01) C08F 287/00 (2006.01)
Patent
CA 1152247
O.Z. 0050/034095 PHOTOPOLMYERIZABLE COMPOSITIONS AND PHOTO-CURABLE ELEMENTS MADE THEREFROM ABSTRACT OF THE DISCLOSURE: Photopolymerizable composi- tions based on an elastomeric styrene-diene block poly- mer, one or more photopolymerizable olefinically unsatu- rated monomers and one or more photopolymerization initiators exhibit improved properties if they contain, as an essential-constituent, an elastomeric block co- polymer of the general structure A-B-C, where A is a thermoplastic, non-elastomeric polymer block based on styrene compounds and having a second order transition point above +25°C, B is an elastomeric polymer block based on butadiene and/or isoprene and having a second order transit1on point below -20°C and C is a polymer block, different from B, having a second order transition point of from - 30°C to + 15°C, C being either a homopolymer or copolymer block based on butadiene or isoprene or a random copolymer block based on conjugated dienes and styrene compounds. The photopolymerizable compo- sitions may be used, inter alia, for the production of photo-curable adhesives, resillent and flexible sheet material and, in particular, flexographic relief printing plates.
362514
Heinz Gerhard
Jun Mong-Jon
Richter Peter
Basf Aktiengesellschaft
Robic Robic & Associes/associates
LandOfFree
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