Photopolymerizable mixture including an aromatic compound...

G - Physics – 03 – F

Patent

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96/150, 400/5057

G03F 7/027 (2006.01)

Patent

CA 1186431

ABSTRACT OF THE DISCLOSURE Disclosed are a photopolymerizable mixture and photopolymerizable copy materials made therefrom. The mixture contains a polymerizable compound having terminal acrylic or methacrylic acid ester groups and being selected from a compound of the formula I Image (I) wherein R1 is a naphthylene group, a biphenyldiyl group or a dinaphthyl-methanediyl group or a group formed by two phenylene groups which are linked by a bridge comprised of an oxygen atom, a sulphur atom, a sulfone group or an alkylene group which is substituted by at least one carboxylic acid group. carboxylic acid alkyl ester groups, halogen atom or phenyl group, or by such a substituted alkylene group which is connected to the group R1 of another molecule via said substituent; R2 is a hydrogen atom or a methyl group; and m is 0 or 1, m being 1 if R1 is a naphthylene group or a biphenyldiyl group.

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