G - Physics – 03 – F
Patent
G - Physics
03
F
96/150, 400/5157
G03F 7/00 (2006.01) C08F 299/04 (2006.01) C08G 63/676 (2006.01) G03F 7/032 (2006.01)
Patent
CA 1059683
PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR ORIGINAL PLATE Abstract of the Disclosure A photopolymerizable resin composition is described for preparing an original relief plate useful for preparing duplicate plates from a thermoplastic matrix by pressing at a high temperature. The novel resin comprises 80 to 40% by weight of an unsaturated polyester containing acid components of A: Image and B: Image wherein A and B are contained in the molar ratio of 0?(B)/(A)?1, and a glycol component of the formula: Image wherein n is 2, 3 or 4, and having an acid value of 15 to 30; 20 to 60% by weight of a crosslinking monomer containing as an essential component .beta.-hydroxyethyl methacrylate; a photopolymerization initiator; and a heat polymerization inhibitor.
227841
Inoue Tadanori
Sano Takezo
Uemura Yukikazu
Na
Sumitomo Chemical Company
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