C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/175, 402/548,
C07C 49/80 (2006.01) C07C 45/46 (2006.01) C07C 45/63 (2006.01) C07C 49/76 (2006.01) C07C 49/796 (2006.01) C07C 49/813 (2006.01) C08F 2/50 (2006.01) C08F 8/18 (2006.01) C08F 8/20 (2006.01) C08F 257/00 (2006.01)
Patent
CA 1064053
ABSTRACT OF THE DISCLOSURE Ethylenically unsaturated monomers in the presence of a novel aromatic oligomeric compound or polymer having a polyhaloacetyl moiety attached thereto are polymerized upon exposure to a source of radiation.
221127
Reiter Ralph H.
Rosen George
Na
Sun Chemical Corporation
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