G - Physics – 03 – F
Patent
G - Physics
03
F
96/178, 400/4206
G03F 7/26 (2006.01) C09D 11/10 (2006.01) H05K 3/28 (2006.01)
Patent
CA 1151789
ABSTRACT OF THE DISCLOSURE: A photopolymerization type resin composition consisting of one or more resins selected from a group consisting of resol type epoxy-acrylates, novolak type epoxy-acrylates, resol type epoxy-methacrylates and novolak type epoxy-meth-acrylates; an unsaturated compound whose end groups of ethylene are less than those of said one or more resins; and a photo-sensitizer. The resin composition is useful for the solder-resist applied to a flexible base plates of printed circuit boards.
347923
Ikeda Junji
Saeki Keiji
Wakahata Tamotsu
Gowling Lafleur Henderson Llp
Matsushita Electric Industrial Co. Ltd.
LandOfFree
Photopolymerization type resin composition and solder resist... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photopolymerization type resin composition and solder resist..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photopolymerization type resin composition and solder resist... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-214610