C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
402/1, 96/150, 4
C07C 69/82 (2006.01) C08G 65/00 (2006.01)
Patent
CA 1046077
\; Abstract of the Disclosure A photoreactive composition containing an effective amount of a compound having at least two alkoxyaromaticglyoxy substituents per molecule, which substituents have the fol- lowing general formula: Image wherein R is selected from the class consisting of H, aryl, alkyl, halo and arakyl having up 10 carbon atoms, n is an integer from 1 to 18, Ar is an aromatic substituent, and M is selected from the class consisting of H, alkali metal, ammoni- um, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical pro- cesses and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coat- ings of presensitized lithographic plates.
181628
Jones Thomas H.
Muzyczko Thaddeus M.
Richardson Company (the)
LandOfFree
Photoreactive compositions and products made therewith does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoreactive compositions and products made therewith, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoreactive compositions and products made therewith will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-887866