Photoreactive resin compositions developable in a...

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G - Physics

03

F

96/172

G03F 7/038 (2006.01)

Patent

CA 2025681

-24- EL-0282 ABSTRACT This invention concerns a photosensitive polymer composition that can be developed using an aqueous alkaline developer solution. The photosensitive polymer composition is useful for forming relief structures on electrical devices.

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