Photoresist

Details Photoresist Photoresist

G - Physics

03

F

96/172

G03F 7/038 (2006.01) G03F 7/027 (2006.01) G03F 7/16 (2006.01) G03F 7/20 (2006.01) G03F 7/30 (2006.01)

Patent

CA 2018988

Photocurable and solvent-developable compositions based on photopolymerizable (meth)acrylates, a photoinitiator for (meth)acrylates, an organic polymeric binder which comprises free carboxyl groups and has an acid number of at least 60, a blocked polyisocyanate crosslinking agent which has a cleavage temperature of at least 100°C, and an inert solvent in an amount such that the photocurable composition is pourable, are described.

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