Photoresist compositions

Details Photoresist compositions Photoresist compositions

G - Physics

03

F

96/84

G03F 7/039 (2006.01) G03F 7/004 (2006.01)

Patent

CA 1331926

Abstract Positive-working photoresist compositions containing (a) an epoxide resin which can be hardened by heat, (b) a latent urea or imidazole hardener for the component (a) and (c) an iron- arene complex of the formula (I) Image (I) in which n is 1 or 2, m is 1, 2, 3, 4 or 5, X is a non- nucleophilic anion, R1 is a .pi.-arene and R2 is an anion of a .pi.-arene, are described. These compositions are distinguished by good properties towards heat and chemicals and require short exposure times.

569163

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