Photoresist compositions

Details Photoresist compositions Photoresist compositions

G - Physics

03

F

96/158

G03F 7/022 (2006.01) G03F 7/16 (2006.01)

Patent

CA 2010594

Abstract of the Disclosure Photoresist compositions Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) Image (I), wherein one of the substituents X is hydrogen or a group of formula II Image (II) and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III Image (III), wherein X is a direct bond, -O-, -S-, -SO2-, -CO- or C(R6(R7)-, and R1, R2, R3, R4 and R5 are each independently of the other hydrogen, halogen, C1-C4alkyl, C1-C4alkoxy or hydroxy, and R6 and R7 are each independently of the other hydrogen, -CH3 or C13 These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.

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