Photoresist compositions comprising diamondoid derivatives

Details Photoresist compositions comprising diamondoid derivatives Photoresist compositions comprising diamondoid derivatives

G - Physics

03

F

G03F 7/039 (2006.01)

Patent

CA 2540570

Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid- containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain a lactone group. Advantages of the present compositions include enhanced resolution, sensitivity, and adhesion to the substrate.

L'invention concerne des nouvelles compositions de photorésine positive. Les monomères de la résine de base de la réserve contiennent des groupes pendants contenant un diamantoïde supérieurs à l'adamantane dans la série des polymantanes, tels que le diamantane, le triamantane, le tétramantane, le pentamantane, l'hexamantane, etc. Le groupe pendant contenant un diamantoïde peut comprendre des substituants améliorant l'hydrophilie, tels qu'un groupe hydroxyle, et peut renfermer un groupe lactone. Les avantages des présentes compositions incluent une augmentation de la résolution, de la sensibilité et de l'adhésion au substrat.

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