G - Physics – 03 – F
Patent
G - Physics
03
F
96/150
G03F 7/004 (2006.01)
Patent
CA 1286532
PHOTORESIST COMPOSITIONS CONTAINING QUINONE SENSITIZER Abstract Positive-working imaging compositions comprise a polymeric binder and a quinone sensitizer which provides alkali solubility to the composition when exposed to activating radiation.
520257
Dominh Thap
Fleming James C.
Lindstrom Michael J.
Dominh Thap
Eastman Kodak Company
Fleming James C.
Gowling Lafleur Henderson Llp
Lindstrom Michael J.
LandOfFree
Photoresist compositions containing quinone sensitizer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresist compositions containing quinone sensitizer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist compositions containing quinone sensitizer will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1196035