Photoresist containing aliphatic di- and tri-esters of...

Details Photoresist containing aliphatic di- and tri-esters of... Photoresist containing aliphatic di- and tri-esters of...

G - Physics

03

F

96/158

G03F 7/022 (2006.01) G03F 7/004 (2006.01) G03F 7/016 (2006.01) G03F 7/038 (2006.01) G03F 7/039 (2006.01)

Patent

CA 2033403

ABSTRACT A photosensitive composition containing an alkali soluble resin, a photosensitizer compound and a plasticizer which is selected from aliphatic di- and tri-esters of aliphatic and aromatic di- and tri-acids and alcohols in a solvent mixture. After drying and imagewise exposing, the composition is developed to produce a positive photoresist image.

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