Photoresist film with non-photosensitive resist layer

Details Photoresist film with non-photosensitive resist layer Photoresist film with non-photosensitive resist layer

H - Electricity

05

K

96/190, 96/266

H05K 1/00 (2006.01) G03F 7/09 (2006.01) G03F 7/16 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1051707

Abstract of the Disclosure A non-photosensitive resist layer is interposed between a photoresist layer and a substrate on which an image is desired to be formed. The non-photosensitive resist layer may be removable by developer for the photoresist layer, or it may require a separate developer. The properties of the non-photosensitive resist layer and the photoresist layer may comprise a two layer photosensitive element which may be laminated to a substrate, or may be applied to the substrate by liquid application.

211185

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