Photoresist material comprising an o-quinone diazide...

Details Photoresist material comprising an o-quinone diazide... Photoresist material comprising an o-quinone diazide...

G - Physics

03

C

96/150

G03C 1/54 (2006.01) G03F 7/023 (2006.01)

Patent

CA 1115586

ABSTRACT OF THE DISCLOSURE The present invention provides a photoresist compo- sition, comprising a photosensitizer, a polymeric material which is rendered developable by the action of radiation on the photosensitizer, and a rosinous material selected from the group of rosin, hydrogenated rosin, esterified rosin, neutralized rosin, esterified hydrogenated rosin, esterified neutralized rosin, and mixtures thereof.

283045

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