Photoresist stripping and cleaning compositions

Details Photoresist stripping and cleaning compositions Photoresist stripping and cleaning compositions

G - Physics

03

F

G03F 7/32 (2006.01) G03F 7/42 (2006.01) H01L 21/77 (2006.01)

Patent

CA 2214628

A stripping and cleaning composition comprising water, at least one amine compound, and at least one corrosion inhibitor selected from (a) quaternary ammonium silicate and (b) a catechol nucleus-containing oligomer having a molecular weight of about 220 to about 5,000, and optionally a polar organic solvent.

Composition de décapage et de nettoyage comprenant de l'eau, au moins un composé aminé et au moins un inhibiteur de corrosion choisi parmi (a) un silicate d'ammonium quaternaire et (b) un oligomère contenant un noyau catéchol de poids moléculaire d'environ 220 à environ 5 000 et, facultativement, un solvant organique polaire.

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