Photosensitive bodies including an o-nitroarylmethyl ester

Details Photosensitive bodies including an o-nitroarylmethyl ester Photosensitive bodies including an o-nitroarylmethyl ester

G - Physics

03

F

96/172, 96/210

G03F 7/004 (2006.01)

Patent

CA 1164262

PHOTOSENSITIVE BODIES Abstract Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o-nitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

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