Photosensitive coating composition

Details Photosensitive coating composition Photosensitive coating composition

G - Physics

03

C

G03C 1/52 (2006.01) G03F 7/022 (2006.01) G03F 7/029 (2006.01) G03F 7/033 (2006.01) G03F 7/22 (2006.01)

Patent

CA 2064159

PHOTOSENSITIVE COATING COMPOSITION Abstract A composition for forming a photosensitive coating is disclosed which includes: (a) a photosensitive agent which is an o-naphthoquinone diazide compound, (b) a polyvinylpyrrolidone compound, and (c) a stannic halide, wherein the o-naphthoquinone diazide compound is present in an amount of 5-50 parts by weight per 100 parts by weight of the polyvinylpyrrolidone compound and the stannic halide is present in an amount of 4-40 % based on the weight of the o-naphthoquinone diazide compound.

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