Photosensitive coating composition and use thereof

Details Photosensitive coating composition and use thereof Photosensitive coating composition and use thereof

G - Physics

03

F

96/179, 96/252,

G03F 7/26 (2006.01) C08F 299/02 (2006.01) C08G 59/16 (2006.01) C08L 63/10 (2006.01) G03C 5/16 (2006.01) G03F 7/032 (2006.01)

Patent

CA 1114541

Abstract of the Disclosure A photosensitive coating composition useful in form- ing resist masks comprises reaction products of a mono- ethylenically unsaturated carboxylic acid and two differ- ent epoxy polymers; a polyethylenically unsaturated com- pound; and photoinitiator; and method of employing the same. One of said epoxy polymers has the general formula: Image The other of said epoxy polymers has the general formula: Image

313481

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