G - Physics – 03 – F
Patent
G - Physics
03
F
96/167
G03F 7/021 (2006.01) C08G 18/08 (2006.01) C08G 18/34 (2006.01)
Patent
CA 1308595
ABSTRACT OF THE DISCLOSURE A photosensitive composition is described, comprising a diazonium compound and a polyurethane resin having a carboxyl group in its main chain. The composition can be developed with an aqueous alkali developer to provide a lithographic printing plate having a long press life.
523494
Aoai Toshiaki
Kamiya Akihiko
Maemoto Kazuo
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Fuji Photo Film Co. Ltd.
LandOfFree
Photosensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1207624