G - Physics – 03 – C
Patent
G - Physics
03
C
96/163
G03C 1/60 (2006.01) G03F 7/021 (2006.01)
Patent
CA 1264022
Abstract: A photosensitive composition comprises: (a) a photosensitive diazo resin represented by the general formula (I): Image (I) wherein R1, R2 and R3 each represents a hydrogen atom, an alkyl or alkoxy group, R represents a hydrogen atom, an alkyl or phenyl group, X represents PF6 or BF4 and n represents a number of 1 to 200, in which resins of the above formula in which n is at least 5 are present in an amount of more than 20 mol %, (b) an oleophilic high molecular compound containing a hydroxyl group and (c) a high molecular organic acid without hydroxyl group, and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition.
492785
Goto Kiyoshi
Maeda Yoshihiro
Suzuki Norihito
Tomiyasu Hiroshi
Goto Kiyoshi
Kirby Eades Gale Baker
Konishiroku Photo Industry Co. Ltd.
Maeda Yoshihiro
Suzuki Norihito
LandOfFree
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