G - Physics – 03 – F
Patent
G - Physics
03
F
96/172, 400/5152
G03F 7/004 (2006.01) G03C 1/72 (2006.01) G03F 7/031 (2006.01) G03F 7/032 (2006.01)
Patent
CA 1331243
Abstract of the Disclosure A photosensitive composition comprising: (a) a polymer having recurring units repre- sented by the formula [I] Image wherein X is a (2 + m) valent C6-30 carbocyclic group or heterocyclic group ; Y is a (2 + n) valent C6-30 carbocyclic group or heterocyclic group ; z is Image , Image or Image ; A is -COOR* or -COO?R**? wherein each of R* and R** is a group having a carbon-carbon double bond ; W is a group capable of reacting with the carbonyl group of A to form a ring on heating ; A and W are arranged in ortho- or peri- position to z ; m is 1 or 2 ; and n is 0, 1 or 2 , (b) 1 to 20 % by weight, based on the weight of polymer (a), of a compound having a terminal ethylenically unsaturated group ; (c) 0.1 to 20 % by weight, based on the weight of polymer (a), of an oxime ester compound represented by the formula [II] Image wherein each of R1, R2 and R3 is a hydrogen atom, a C1-6 alkyl group, a C1-6 alkoxy group or a nitro group; R4 is a C7-11 aromatic acyl group, a C2-7 aliphatic acyl group, a C2-7 alkoxycarbonyl group, a C6-10 aromatic sulfonyl group or a C1-6 aliphatic sulfonyl group ; and R5 is a C1-6 alkyl group, a C1-6 alkoxy group, a C6-10 aromatic group or a C6-10 aryloxy group ; and (d) 0.01 to 10 % by weight, based on the weight of polymer (a), of a coumarin compound having a wave length of the absorption peak of 330 to 550 nm.
574437
Ai Hideo
Ikeda Akihiko
Ogitani Satoshi
Suga Nobuhiko
Takahashi Hideaki
Asahi Kasei Kogyo Kabushiki Kaisha
Goudreau Gage Dubuc
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