Photosensitive composition

Details Photosensitive composition Photosensitive composition

G - Physics

03

F

G03F 7/022 (2006.01) G03F 7/023 (2006.01) G03F 7/039 (2006.01) G03F 7/105 (2006.01)

Patent

CA 2085868

57 ABSTRACT OF THE DISCLOSURE Disclosed herein is a photosensitive composition comprising: (A) 5 to 60 wt% of an o-quinonediazide compound; (B) 0.05 to 10 wt% of an s-triazine compound (C) 0.01 to 10 wt% of a dye for changing the color tone by the interaction with the photodecomposition product of the said s-triazine compound; (D) 30 to 90 wt% of a novolak resin containing less than 5 wt% of phenols; and (E) 1 to 60 wt% of a vinyl-based polymer having at least a phenolic hydroxyl group.

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