Photosensitive composition

Details Photosensitive composition Photosensitive composition

G - Physics

03

F

G03F 7/021 (2006.01) G03F 7/033 (2006.01)

Patent

CA 2073147

ABSTRACT A photosensitive composition comprising a photosensitive material and a polymer, wherein the polymer comprises from 2 to 50 mol% of hydroxyalkyl (meth)acrylate units, of which the main component is units of a hydroxyalkyl (meth)acrylate of the following formula (I): Image (I) wherein R1 is a hydrogen atom or a methyl group, and n is an integer of from 3 to 10.

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