Photosensitive composition

Details Photosensitive composition Photosensitive composition

G - Physics

03

C

96/158

G03C 1/52 (2006.01) C08G 8/28 (2006.01) G03F 7/023 (2006.01) G03F 7/105 (2006.01)

Patent

CA 2000111

Abstract of the Disclosure A photosensitive composition comprising (a) a 1,2- naphthoquinone-2-diazido-4-sulfonic acid ester compound, (b) alkali-soluble resin, (c) a halomethyloxadiazole compound which releases halogen free radicals by irradiation with actinic rays and (a) a dye which interacts withthe decomposition product of said halomethyloxydiazole compound and discolors or develops color. The composition exhibits excellent development latitude, light safety, visible-on-exposure characteristic and printing resistance.

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