G - Physics – 03 – C
Patent
G - Physics
03
C
96/162
G03C 1/60 (2006.01) G03C 1/74 (2006.01) G03F 7/021 (2006.01) G03F 7/038 (2006.01)
Patent
CA 1041346
ABSTRACT OF THE DISCLOSURE A photosensitive composition is prepared comprising a diazo-aromatic compound and a polymer containing 50 to 100% by weight of the recurring unit represented by the following general formula (I): Image (I) wherein R1 represents hydrogen atom or methyl group, R2 represents hydrogen atom or a methyl, ethyl or chloromethyl group and n is an integer of 1 to 10. The balance of the units consist essentially of units of a compound having a single addition polymerizable unsaturated bond and free of groups reactive with a hydroxyalkyl group. The composition has improved properties, as compared with the prior art.
205472
Kita Nobuyuki
Narutomi Yasuhisa
Fuji Photo Film Co.
National Patent Development Corporation
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