Photosensitive composition

Details Photosensitive composition Photosensitive composition

C - Chemistry, Metallurgy

07

C

96/152

C07C 49/697 (2006.01) G03F 7/031 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1052164

ABSTRACT OF THE DISCLOSURE A photosensitive composition is prepared from a mixture of a cinnamic acid type photosensitive resin and a sensitizer of a halogen-substituted benzanthrone.

201325

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