Photosensitive composition

Details Photosensitive composition Photosensitive composition

G - Physics

03

F

96/172, 96/179

G03F 7/027 (2006.01) G03F 7/033 (2006.01)

Patent

CA 1288994

Abstract: The invention provides a photosensitive composition comprising: (a) a vinyl alcohol polymer containing the following structural unit A and having a saponification degree of a vinyl ester unit of not less than 70 mol%: A: Image wherein R1, R2 and R3 each represents H or a hydro- carbon group having 1 to 4 carbon atoms; (b) a radically polymerizable ethylenic unsaturated compound; and, (c) a photopolymerization initiator. The composition is capable of forming a material having good flexibility and impact resistance which can maintain sufficient softness but is not subject to breakage even at low temperature and low humidity. Resin plates showing high printing quality can be obtained from the photosensitive composition.

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