G - Physics – 03 – C
Patent
G - Physics
03
C
400/5152, 96/73
G03C 1/00 (2006.01) G03F 7/09 (2006.01) G03F 7/105 (2006.01)
Patent
CA 1311071
Abstract: A photosensitive composition principally comprised of a photosensitive diazo resin and a lipophilic high molecular compound, wherein said photosensitive composition further contains a metal complex dye soluble in an organic solvent. Also disclosed is a photosensitive lithographic printing plate employing such a photosensitive composition.
522455
Goto Kiyoshi
Maeda Yoshihiro
Shimizu Shigeki
Suzuki Norihito
Goto Kiyoshi
Maeda Yoshihiro
Marks & Clerk
Mitsubishi Chemical Industries Limited
Mitsubishi Kasei Corporation
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