Photosensitive composition and photosensitive lithographic...

G - Physics – 03 – F

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

96/158, 101/61

G03F 7/021 (2006.01)

Patent

CA 2016075

Abstract: photosensitive composition a printing plate Disclosed is a photosensitive composition comprising a diazo resin and a polymeric compound containing a structural unit represented by the following formula (I) in the molecule: Formula (I) Image wherein J represents a divalent linking group and n is 0 or 1. Disclosed is also a photosensitive lithographic printing using the photosensitive composition.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive composition and photosensitive lithographic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive composition and photosensitive lithographic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition and photosensitive lithographic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1446972

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.