Photosensitive composition and photosensitive planographic...

Details Photosensitive composition and photosensitive planographic... Photosensitive composition and photosensitive planographic...

G - Physics

03

F

G03F 7/023 (2006.01) G03F 7/021 (2006.01) G03F 7/039 (2006.01)

Patent

CA 2173638

A photosensitive composition which comprises a resin (A) having urea bonds in its side chains and a photosensitive compound (B), wherein the resin (A) contains at least one resin selected from the group consisting of a vinyl polymer resin and a condensation polymer resin, provides a coating layer with excellent resistance to solvents and abrasion. The photosensitive composition is suitable for use in the production of planographic printing plates, integrated circuits (IC) or photomasks. A photosensitive planographic printing plate produced usig the photosensitive composition has superior press-life.

Affiliated with

Also associated with

Rating

Photosensitive composition and photosensitive planographic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive composition and photosensitive planographic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition and photosensitive planographic... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1685663