Photosensitive composition and process for preparing same

Details Photosensitive composition and process for preparing same Photosensitive composition and process for preparing same

G - Physics

03

C

96/44

G03C 1/52 (2006.01)

Patent

CA 1059362

PHOTOSENSITIVE COMPOSITION AND PROCESS FOR PREPARING SAME Abstract of the Disclosure A photosenstive composition is described containing a water-soluble graft copolymer of a partially hydrolyzed poly- vinyl acetate grafted with acrylonitrile and optionally another vinylic monomer, a polymeric emulsion and a diazo compound. The novel composition, which is useful in screen printing possesses high resistance to solvent, abrasion and moisture.

227299

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