4. G - Physics
  5. 03
  6. C

Photosensitive composition containing an orthoquinone...

G - Physics – 03 – C

Patent

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96/165, 96/172

G03C 1/54 (2006.01)

Patent

CA 1119446

ABSTRACT OF THE DISCLOSURE The present invention relates to a novel photosen- sitive composition. In particular, the present invention relates to a photosensitive resin composition suitable for use as a photoresist. -24-

317537

Ohbayashi Gentaro

G - Physics – 03 – C
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Yoshino Tsuneo

G - Physics – 03 – C
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Smart & Biggar

G - Physics – 01 – V
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Toray Industries Inc.

D - Textiles – Paper – 01 – F
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