G - Physics – 03 – C
Patent
G - Physics
03
C
96/165, 96/172
G03C 1/54 (2006.01)
Patent
CA 1119446
ABSTRACT OF THE DISCLOSURE The present invention relates to a novel photosen- sitive composition. In particular, the present invention relates to a photosensitive resin composition suitable for use as a photoresist. -24-
317537
Ohbayashi Gentaro
Yoshino Tsuneo
Smart & Biggar
Toray Industries Inc.
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