Photosensitive composition containing diazo compound and...

Details Photosensitive composition containing diazo compound and... Photosensitive composition containing diazo compound and...

G - Physics

03

C

96/167, 96/210

G03C 1/52 (2006.01) G03F 7/021 (2006.01)

Patent

CA 1060252

ABSTRACT OF THE DISCLOSURE A ?hotosensitive composition is prepared comprising (a) a copolymer having an acid value of 10 to 100 and containing structural units represented by the following general formula I Image [I] where R1 represents a hydrogen atom or methyl group, R2 represents a hydrogen atom,methyl group, ethyl group or chloromethyl group, and n is an integer of from 1 to 10, inclusive, and structural units represented by the follow- ing general formula II Image [II] where, in the formula, R3 represents a hydrogen atom or methyl group, and (b) a diazo compound and, optionally, (c) a resin having hydrophilic groups.

221185

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