Photosensitive compositions

Details Photosensitive compositions Photosensitive compositions

C - Chemistry, Metallurgy

08

F

96/179

C08F 287/00 (2006.01) G03F 7/033 (2006.01)

Patent

CA 1101586

ABSTRACT OF THE DISCLOSURE The invention relates to relief printing plates prepared from compositions consisting of I) a monovinyl- arene-diene block copolymer; II) an addition-photo- polymerizable polyunsaturated ester derived from acrylic or methacrylic acid; III) an addition polymerization initiator activatable by actinic radiation, and option- ally a low molecular weight liquid rubber.

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