Photosensitive compositions based on polyphenols and acetals

Details Photosensitive compositions based on polyphenols and acetals Photosensitive compositions based on polyphenols and acetals

G - Physics

03

F

G03F 7/039 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2062066

K-18560/A Photosensitive compositions based on polyphenols and acetals Abstract Photosensitive compositions comprising a) at least one solid film-forming polyphenol, b) at least one compound of formula I Image (I), wherein n is 2, 3 or 4, Ar is an n-valent benzene or naphthalene radical or a divalent radical of formula II Image (II), Q is a direct bond, -O-, -SO-, -SO2-, -CH2-, -C(CH3)(phenyl)- or -C(CH3)2-, each of R1 and R2, independently of the other, is C1-C8alkyl, or phenyl or naphthyl each of which is unsubstituted or substituted by C1-C4alkyl, or R1 and R2 together are 1,2-phenylene or -[C(R')(R")]m-, each of R' and R", independently of the other, is hydrogen, C1-C4alkyl or phenyl and m is 2, 3 or 4, and c) at least one compound that forms an acid under actinic radiation are described. Those compositions are used as negative resists, especially for producing printing plates, printed circuits and integrated circuits.

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