C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/150, 400/5154
C08F 30/08 (2006.01) G03F 7/075 (2006.01)
Patent
CA 1264890
ABSTRACT OF THE DISCLOSURE Photosensitive film usable more particularly in microlithography for producing electronic components. The film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon- containing polymer-based photosensitive film can be used as a masking resin in a lithography process. B 8393.3
491129
Buiguez Francois
Giral Louis
Rosilio Charles
Schue Francois
Commissariat A. L'energie Atomique
Goudreau Gage Dubuc
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