C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/1, 96/150, 8
C08F 2/50 (2006.01) C07C 45/00 (2006.01) C07C 45/46 (2006.01) C07C 45/63 (2006.01) C07C 45/64 (2006.01) C07C 45/67 (2006.01) C07C 45/71 (2006.01) C07C 49/76 (2006.01) C07C 49/80 (2006.01) C07C 49/82 (2006.01) C07C 49/83 (2006.01) C07C 49/84 (2006.01) C08F 299/04 (2006.01) C08K 3/28 (2006.01) C08K 5/07 (2006.01) C09D 11/10 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1233931
ABSTRACT OF THE DISCLOSURE Novel photopolymerizable compositions are provided herein. They contain at least one photopolymerizable unsaturated compound and a photo- sensitizingly effective amount of the following compound of formula (I) Image (I) wherein R1 is hydrogen, chlorine, phenyl, dialkylamino of 2 - 4 carbon atoms or alkyl or alkoxy,each of up to 18 carbon atoms; R2 is hydrogen, chlorine, bromine or alkyl or alkoxy, each of up to 4 carbon atoms; R3 and R4,which can be the same or different, each is alkyl of up to 6 carbon atoms; R5 is hydrogen; and R6 is hydrogen or methyl. These com- pounds of formula (I) are effective photosensitizers, especially for photopolymerization of unsaturated compounds and for hardening of printing dyes, and may be used for photopolymerizing a photopolymerizable composi- tion, or for hardening a printing dye.
303400
Gehlhaus Jurgen
Kieser Manfred
Borden Ladner Gervais Llp
Ciba Specialty Chemicals Holding Inc.
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