Photosensitive lithographic plate with sulfonate containing...

Details Photosensitive lithographic plate with sulfonate containing... Photosensitive lithographic plate with sulfonate containing...

C - Chemistry, Metallurgy

08

G

96/178

C08G 63/688 (2006.01) G03F 7/032 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1178473

- 1 - TITLE OF THE INVENTION Photosensitive lithographic plate ABSTRACT OF THE DISCLOSURE A photosensitive lithographic plate having, on a substrate, a photosensitive layer comprising a photosensitive polyester containing at least (A): (a) an aromatic dicarboxylic acid unit represented by the general formula: Image ..... (I) where m and n each represents an integer of 0 or 1, with at least one of them being 1, (b) a dicarboxylic acid unit having a sulfonate group, and (c) a diol unit represented by the general formula: Image ..... (II) where Image represents a hydrogenated benzene ring, and R2 each represents an alkylene group of 2-4 carbon atoms, R3 and R4 each represents a hydrogen atom or an alkyl group of 1-6 carbon atoms, r and s each represents an integer of from 0 to 3 and t represents an integer of 0 or 1.

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