Photosensitive material and image forming method

Details Photosensitive material and image forming method Photosensitive material and image forming method

G - Physics

03

F

96/219

G03F 7/26 (2006.01) G03F 7/028 (2006.01) G03F 7/09 (2006.01) G03F 7/105 (2006.01)

Patent

CA 1336145

A photosensitive material comprises a photo- sensitive layer and a polymerizable layer which are laminated. An area of the polymerizable layer, corresponding to an unexposed area of the photosensitive layer, is polymerized when the photosensitive material is exposed to light with a wavelength of 400 to 900 nm and heated to 60 to 80°C.

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