Photosensitive materials

Details Photosensitive materials Photosensitive materials

C - Chemistry, Metallurgy

08

F

96/152, 402/403,

C08F 220/02 (2006.01) G03F 7/032 (2006.01) G03F 7/033 (2006.01) G03F 7/038 (2006.01)

Patent

CA 1041698

ABSTRACT Photosensitive materials are disclosed which may be imagewise exposed and developed to form for example a lito plate or resist image. The photosensitive materials comprise a support and a layer having a polymer containing repeating units containing a polyhalogen group having two or three halogen atoms bonded to the same carbon atom and repeating units containing an olefinically unsaturated group and comprising at least one metal carbonly or metal carbonyl derivative.

212535

Affiliated with

Also associated with

Rating

Photosensitive materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1078718