C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
96/2, 400/3012
C08L 51/08 (2006.01) G03F 7/00 (2006.01) G03F 7/012 (2006.01) G03F 7/021 (2006.01)
Patent
CA 2019365
Abstract Photosensitive mixture and recording material produced therefrom The invention discribes a photosensitive mixture which contains a photocurable compound, for example, a diazonium salt polycondensation product, or a photocurable combination of compounds, for example, a photopolymerizable mixture, and a polymeric binder, which binder is a graft copolymer with a polyurethane graft backbone onto which chains containing vinyl alcohol units and vinyl acetal units derived from hydroxyaldehydes are grafted. The mixture is suitable for use in the production of printing plates and photoresists, can be developed with purely aqueous solutions and gives printing plates distinguished by high resistance to mechanical and chemical attacks.
Kroggel Matthias
Mohr Dieter
Mueller-Hess Waltraud
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
Kroggel Matthias
Mohr Dieter
Mueller-Hess Waltraud
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