Photosensitive polycondensation compound for negative...

Details Photosensitive polycondensation compound for negative... Photosensitive polycondensation compound for negative...

C - Chemistry, Metallurgy

09

B

C09B 31/30 (2006.01) B41N 1/00 (2006.01) C08G 61/12 (2006.01) G03F 7/021 (2006.01)

Patent

CA 2120404

- 1 - "Photosensitive polycondensation compound for negative lithographic plates." ABSTRACT Process for preparing a photosensitive polycondensation compound in the presence of condensing medium which is a mixture containing from 30 to 5 parts by weight of 98% aqueous methanesulfonic acid and from 70 to 95 parts by weight of 85% aqueous phosphoric acid, respectively. Thus obtained polycondensation compound and printing plates containing it.

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