G - Physics – 03 – F
Patent
G - Physics
03
F
96/150, 96/172
G03F 7/027 (2006.01) C08F 291/18 (2006.01) C09D 4/06 (2006.01)
Patent
CA 1120305
Abstract of the Disclosure A photosensitive polymer composition comprising: (1) a developer soluble polymer selected from the group consist- ing of (a) a soluble polymer and photopolymerizable ethylenical- ly unsaturated compound(s), or (b) a soluble polymer having photopolymerizable ethylenically unsaturated groups in the polymer chain, and (2)about 0.01 to 10 parts, by weight, of a photosensitizer or photoinitiator to 100 parts, by weight, of the composition, and (3) about 0.001 to 10 parts, by weight, of a member selected from the group consisting of the ascorbic acids and their derivative to 100 parts, by weight of (1) (a) or (1) (b). These polymers are used in the preparation of printing plates, photoresistors, photocurable paints, adhesives, and other image forming materials.
290342
Akama Tadashi
Sakai Kuniyuki
Smart & Biggar
Toray Industries Inc.
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