Photosensitive resin and element made therefrom

Details Photosensitive resin and element made therefrom Photosensitive resin and element made therefrom

C - Chemistry, Metallurgy

08

F

96/161, 402/59

C08F 216/06 (2006.01) C08F 8/30 (2006.01) C08F 8/44 (2006.01) C08F 218/08 (2006.01) G03C 1/56 (2006.01) G03F 7/027 (2006.01)

Patent

CA 2026018

Abstract A polymeric compound having the formula Image wherein R is selected from the group consisting of phenyl and C1 to C4 alkyl substituted phenyl; K is selected from the group consisting of Image , -S-, -O-, and -CH2-, or is absent; P and P1 are selected from the group consisting of C1 to C4 alkyl, methoxy, ethoxy, butoxy, and H; P1 may be the same as P or different; and X- is a sulfonate anion; and n ranges from about 50 to 1500.

Affiliated with

Also associated with

Rating

Photosensitive resin and element made therefrom does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive resin and element made therefrom, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin and element made therefrom will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1578770