G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/021 (2006.01) G03F 7/016 (2006.01)
Patent
CA 2081714
- 37 - ABSTRACT OF THE DISCLOSURE Disclosed is a photosensitive diazo resin for lithographic printing represented by the formula: Image (wherein X- is a counter anion, Y is a divalent bonding group selected from the group consisting of -NH-, -S- and -O-, R1, R2 and R3 are groups which are independently selected from the group consisting of hydrogen, an alkyl group and an alkoxy group, R4 and R5 are groups which are independently selected from the groups consisting of hydrogen, an alkyl group and a phenyl group, 1 and m are integere which satisfy the relation: 1 + m = 2 to 100, 1/m = 30 to 99/1 to 70 and A is a quaternary ammonium salt-containing group represented by the formula: Image X- or Image X- (wherein B is a straight or branched divalent C1-10 alkyl group which bonds to an aromatic ring by a group selected from the group consisting of -CH2-,-CO-, O-, -S- and -N- - 38 - and R6, R7 and R8 are groups which are independently selected from the group consisting of hydrogen and a C1-20 alkyl group provided that at least two of R6, R7 and R8 are alkyl groups)]. A photosensitive resin composition for lithographic printing comprising a diazo resin is also disclosed.
Edward Lam
Kanda Kazunori
Nanba Osamu
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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