G - Physics – 03 – C
Patent
G - Physics
03
C
96/43
G03C 1/72 (2006.01) G03F 7/032 (2006.01)
Patent
CA 1055760
PHOTOSENSITIVE RESIN COMPOSITION ABSTRACT OF THE DISCLOSURE A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, Image wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been in- corporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensi- tive plate capable of being developed with water to give a clear image. Since the pullulan in said com- position has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.
213343
Furuta Akihiro
Sano Takezo
Uemura Yukikazu
Hayashibara Biochemical Laboratories
Sumitomo Chemical Company
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