Photosensitive resin composition

G - Physics – 03 – C

Patent

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96/43

G03C 1/72 (2006.01) G03F 7/032 (2006.01)

Patent

CA 1055760

PHOTOSENSITIVE RESIN COMPOSITION ABSTRACT OF THE DISCLOSURE A photosensitive resin composition comprising pullulan, which is a polymer having repetition units of maltotriose and is represented by the formula, Image wherein n is an integer of 20 to 8,000, and/or a derivative thereof, a photopolymerizable monomer, a photosensitizer and a thermal polymerization inhibitor, or comprising the said pullulan, which has been in- corporated with a photoactive reaction group to provide photosensitivity, and a photosensitizer, is a novel composition low in viscosity which can be prepared by use of water and can be formed into a photosensi- tive plate capable of being developed with water to give a clear image. Since the pullulan in said com- position has no toxicity, the waste water formed at the time of development of said photosensitive plate can be treated with ease.

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